Internal Photoemission Spectroscopy: Principles and Applications

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Elsevier, 2010 M07 7 - 312 páginas
The monographic book addresses the basics of the charge carrier photoemission from one solid to another - the internal photoemission, (IPE) - and different spectroscopic applications of this phenomenon to solid state heterojunctions. This is the first book in the field of IPE, which complements the conventional external photoemission spectroscopy by analysing interfaces separated from the sample surface by a layer of a different solid or liquid. IPE is providing the most straightforward and, therefore, reliable information regarding the energy spectrum of electron states at interfaces. At the same time, the method provides the unique capability of analysing the heterostructures relevant to the modern micro- and nano-electronic devices as well as new materials involved in their design and fabrication.

In addition to the discussion of fundamental physical and technical aspects of IPE spectroscopic applications, several “hot topics are addressed. These include development of new insulating materials for advances Si MOS technology (both high-k gate insulators and low-k dielectrics for interconnect insulation), metal gate materials, development of heterostructures based on high-mobility semiconductors, etc. Thanks to a considerable activity in this field over the last few years, the recent results concerning band structure of most important interfaces involving novel materials can now be documented.

- First complete description of the internal photoemission phenomena
- A practical guide to internal photoemission measurements
- Describes reliable energy barrier determination procedures
- Surveys trap spectroscopy methods applicable to thin insulating layers
- Provides an overview of the most recent results on band structure of high-permittivity insulating materials and their interfaces
- Contains a complete collection of reference data on interface band alignment for wide-bandgap insulating materials in contact with metals and semiconductors
 

Contenido

Chapter 1 Preliminary Remarks and Historical Overview
1
Chapter 2 Internal versus External Photoemission
23
Chapter 3 Model Description and Experimental Realization of IPE
48
Chapter 4 Internal Photoemission Spectroscopy Methods
67
Internal Photoemission as Compared to Other Injection Methods
107
Chapter 6 Trapped Charge Monitoring and Characterization
124
Chapter 7 Charge Trapping Kinetics in the InjectionLimited Current Regime
148
Chapter 8 Transport Effects in Charge Trapping
164
Chapter 9 SemiconductorInsulator Interface Barriers
182
Chapter 10 Electron Energy Barriers between Conducting and Insulating Materials
224
Chapter 11 Spectroscopy of Charge Traps in Thin Insulating SiOsub2 Layers
245
Chapter 12 Conclusions
260
References
263
Index
291
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Professor V. Afanas’ev devoted more than 25 years of research to development of novel experimental methods for interface characterization. In particular, a number of techniques based on internal photoemission phenomena were shown to provide unique information regarding electron states in thin films of solids and at their interfaces. In recent years these methods were successfully applied to characterize novel semiconductor heterostructures for advanced micro- and nano-electronic devices.

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